NewsEnd UserHexaTech raises the bar for aluminum nitride substrates with 100 mm production launch
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HexaTech raises the bar for aluminum nitride substrates with 100 mm production launch

Edited by : Staff Editor
3 min read
HexaTech raises the bar for aluminum nitride substrates with 100 mm production launch

The image used in this article is generated with an AI tool and does not depict any real-time moment

HexaTech, Inc. has announced the immediate production release of its new 100 mm diameter single-crystal aluminum nitride (AlN) substrate, marking a significant step in the company's efforts to scale up manufacturing of the advanced semiconductor material. The launch builds on its earlier three-inch diameter substrate introduction and strengthens its product portfolio for commercial optoelectronic and high-power radio frequency (RF) applications.

The company, which describes itself as the world's leading commercial supplier of single-crystal physical vapour transport (PVT)-grown AlN substrates, said the new product combines material performance with production scale and customer value.

100 mm launch marks another step in substrate development

The latest product launch follows a focused development programme spanning approximately 20 years, supported by both public and private investment. According to HexaTech CEO John Goehrke, the achievement will provide a foundation for the company's future expansion plans.

"This tremendous accomplishment is the result of a focused development program, supported over the previous 20 years by both public and private investment, and the outstanding HexaTech team. This success will be the basis of our future expansion efforts, as we drive toward 150 mm and beyond, and close the gap with other high-performance wide bandgap materials," Goehrke said.

HexaTech's Manager of Research and Development, Dr Rafael Dalmau, highlighted the company's established focus on substrate quality, noting that the 100 mm product continues its track record of delivering aluminum nitride material with high structural and surface quality.

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New substrate targets optoelectronics and high-power RF applications

The 100 mm product is designed to address the requirements of HexaTech's commercial optoelectronic and high-power RF customers. The larger substrate diameter is intended to lower the price threshold per unit area, simplify integration into existing fabrication lines and support faster scaling of device production.

HexaTech Vice President of Business Development Gregory Mills said the launch directly addresses these customer requirements by making fabrication-line insertion easier while supporting increased production.

The company's full product range, covering 2-inch, 3-inch and 100 mm diameter substrates, is now available with standard lead times.

HexaTech sets sights on 150 mm and beyond

The 100 mm production release represents an important stage in HexaTech's longer-term substrate development ambitions, with the company targeting 150 mm diameters and larger in the future.

Founded in 2001, HexaTech specialises in the manufacture of single-crystal aluminum nitride substrates. The material supports several advanced technology applications, including long-life UV-C light-emitting diodes (LEDs) for disinfection, deep ultraviolet lasers for biological threat detection, high-voltage switching devices for efficient power conversion and RF components used in satellite communications.

A wholly owned subsidiary of Tokyo-based Stanley Electric, HexaTech has focused on overcoming material science and engineering challenges to commercialise high-quality bulk aluminum nitride for volume production.

Explore AL Circle’s B2B Marketplace to discover aluminum electrical and power products, including conductors, busbars, cables and wires, and connect with suppliers across the industry.

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